# Ebl Process Controller

> Electron Beam Lithography skill for high-resolution nanopatterning with dose optimization and proximity effect correction

- Skill: `a5c-ai/ebl-process-controller` (Agent Skill)
- Install (CLI): `npx skillmds@latest add a5c-ai/ebl-process-controller`
- Raw SKILL.md: https://api.skillmd.com/api/skills/a5c-ai/ebl-process-controller/raw
- Safety review: pending (external: skill-scanner PASS, skillspector PASS)
- Works with: Claude Code, Claude.ai, OpenAI Codex
- Category: Coding & Dev Tools
- Author: a5c-ai (https://skillmd.com/u/a5c-ai)
- Updated: 2026-09-09
- Page: https://skillmd.com/skills/a5c-ai/ebl-process-controller

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# EBL Process Controller

## Purpose

The EBL Process Controller skill provides comprehensive electron beam lithography process control, enabling high-resolution nanopatterning through dose optimization, proximity effect correction, and critical dimension control.

## Capabilities

- Pattern design and fracturing
- Dose optimization and modulation
- Proximity effect correction (PEC)
- Alignment and overlay control
- Resist processing optimization
- Critical dimension (CD) control

## Usage Guidelines

### EBL Process Control

1. **Pattern Preparation**
   - Design in CAD software
   - Fracture into write fields
   - Apply beam step size

2. **Dose Optimization**
   - Run dose matrices
   - Apply PEC algorithms
   - Account for pattern density

3. **Process Integration**
   - Optimize resist thickness
   - Control development conditions
   - Verify feature dimensions

## Process Integration

- Nanolithography Process Development
- Nanodevice Integration Process Flow

## Input Schema

```json
{
  "pattern_file": "string",
  "resist": "string",
  "thickness": "number (nm)",
  "target_cd": "number (nm)",
  "beam_voltage": "number (kV)",
  "beam_current": "number (pA)"
}
```

## Output Schema

```json
{
  "optimized_dose": "number (uC/cm2)",
  "pec_parameters": {
    "alpha": "number",
    "beta": "number",
    "eta": "number"
  },
  "write_time": "number (hours)",
  "expected_cd": "number (nm)",
  "cd_uniformity": "number (3sigma)"
}
```